top of page
Your Source for Thin Film Process & Test Solutions!
Attention Re: US Chips Act & Corporate Funding:
US government & corporations to invest >$100B USD in the semiconductor industry over the next 10 yrs.
NANI's sales & marketing management expertise will strategically position your process & test equipment to compete effectively and close sales during this period of unprecedented growth!
We invite you to visit our EU partner's web site @
Enhancing Magnetic Materials at the Atomic Scale
Based in the Paris area in France, Spin-Ion Technologies provides He+ ion beam systems with processes to tailor magnetic materials. The key feature of the technology is the post-growth control at the atomic scale of structural properties including interface intermixing, chemical order or crystallization. As state of the art, this technology can be used to control magnetic properties of ultra-thin spintronic materials for applications to MRAM, Hard Disk Drive, Racetrack memory devices, magnonics, RF systems, spin logic, sensors or neuromorphic computing.
Light Ion Thin Film Irradiation
Systems
The Helium – S is an ultra-compact and ultra-fast He+ ion beam facility to treat 20 mm coupons with high homogeneity and the Helium-L can process up to 200 mm wafers.
The technology uses a unique Electron Cyclotron Resonance (ECR) ion source with high brightness and no maintenance. The ion beam treatment can be performed at different steps of the fabrication process at either the material or device level. It is the an ideal R&D tool for a variety of magnetic thin film applications.
bottom of page