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Attention Re: US Chips Act & Corporate Funding:
US government & corporations to invest >$100B USD in the semiconductor industry over the next 10 yrs.
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Florine Passivation Solutions
Dublin, Ireland based Nines PV presents the ADE© (atmospheric dry etch) technology: a disruptive, low cost, high volume texturing process for use in the PV solar cell and thin film battery development & manufacturing industry enabling manufacturers to differentiate their offerings in terms of both cost and device performance.
ADE 100
With a small footprint and flexible process development platform the ADE-100 is built around a single atmospheric dry etch reactor. This reactor is similar to the one used in the HVM version of the tool, greatly facilitating the transition from development to production.
R&D Process
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Single lane
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Compact reactor
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Dynamic etching
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Up to 30% F2 concentration
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Multi-zone heating
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Integrated N2 dilution panel
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Total etchant flow up to 35 slm
Development Applications
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Front side Texturing / Black Silicon / nano and micro textures
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Emitter etch back
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Selective emitter scheme
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Pattern etching / selective etching
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Back side emitter removal
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Back side flattening
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Saw damage removal
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PSG removal
HVM ADE
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The HVM tool design is based on multiple parallel atmospheric pressure dry etch reactors. The HVM thoroughput is facilitated by the on-site generation of the etchant gas resulting low CoO in comparision to vacuum processing
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6000 WPH
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Fully automated operation
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Multi-lane design
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Production ready